South Korea explores alternatives to EUV lithography

South Korea's National Assembly recently hosted a seminar focused on core technologies for X-ray lithography equipment. This event underscores the country's interest in developing alternatives to ASML's extreme ultraviolet (EUV) lithography, currently the market leader.

X-ray lithography represents an emerging technology that could potentially overcome the limitations of EUV in the production of next-generation semiconductors. Although EUV is essential for the fabrication of advanced chips, its complexity and high cost are driving countries to explore alternative solutions to ensure self-sufficiency and competitiveness in the semiconductor sector.

The development of a solid X-ray lithography capability could enable South Korea to reduce its dependence on a single supplier and strengthen its position in the global semiconductor industry.